Virtual Lab Tour: Nano-fabrication Hub

The Nano-fabrication Hub in the Clean Room Facility at TIFR Hyderabad is equipped with advanced filtration systems and maintains air cleanliness at an exceptional level of 1000 particles (≥0.5μm) per cubic foot. Here, we demonstrate the procedures involved in photolithography, showing a step-by-step process of fabricating patterns on a 10 x 10 mm^2 Silicon wafer using positive photoresist and how it’s being tailored for magneto-transport measurements. Apart from the above, we have also included snippets of UV lithography—a technique commonly used in semiconductor manufacturing. Ultraviolet light is employed to expose a photoresist material on the wafer’s surface leading to a chemical change in the exposed areas. Depending on the type of photoresist used, it will allow the selective removal of either the exposed or unexposed regions. This selective removal process plays a crucial role in the production of integrated circuits, microprocessors, memory devices, and other semiconductor components.



Written and Directed by: Anshika Mishra
In the frame: Malavika C.